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Characteristics of vacuum coating processing
Release time:
2022-04-11
Features of vacuum coating processing. Vacuum coating is an important aspect of vacuum applications. Vacuum coating processing is based on vacuum technology and uses physical or chemical methods. It incorporates a series of new technologies, including electron beams, molecular beams, ion beams, plasma beams, radio frequency, and magnetron sputtering.
Vacuum Coating Processing Characteristics of vacuum coating. Vacuum coating is an important aspect of vacuum applications. Vacuum coating processing is based on vacuum technology, using physical or chemical methods and incorporating a series of new technologies such as electron beams, molecular beams, ion beams, plasma beams, radio frequency, and magnetron sputtering.
(1) A wide range of film and substrate materials can be selected, film thickness is controllable, and various functional films can be prepared.
(2) Films are prepared in a vacuum, the environment is clean, and they are not easily contaminated, resulting in films with good density, high purity, and uniform coating.
(3) The bonding strength between the film and the substrate is good, and the film is strong.
(4) Dry coating does not produce waste liquid or environmental pollution.
Vacuum coating processing is an important aspect of vacuum Applications. Vacuum coating processing is based on vacuum technology, using physical or chemical methods and incorporating a series of new technologies such as electron beams, molecular beams, ion beams, plasma beams, radio frequency, and magnetron sputtering. It provides film preparation for scientific research and actual production.
As we all know, some materials, after coating a thin film on their surface, can possess many new and good physicochemical properties. In the 1970s, the main methods for coating the surface of objects were electroplating and electroless plating. The former passes an electric current through an electrolytic solution, and the electrolyzed ions are deposited on the substrate surface as another electrode. Therefore, the substrate must be a good electrical conductor, and the film thickness is difficult to control. The latter is a chemical reduction method, which requires the film material to be formulated into a solution and be able to participate in a rapid reduction reaction. Therefore, these two coating processes, known as wet coating, are subject to significant limitations.
Vacuum Coating Processing It is a new type of film deposition technology developed in contrast to the above-mentioned wet film deposition, often called dry film deposition technology.
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