PVD coating machine layering technology
Release time:
2022-01-27
PVD coating machine cathode arc filtration: The electromagnetic filtration system is equipped with an ion source, which can filter out macroscopic particles and ions generated in the plasma. The ionization rate of deposited particles after magnetic filtration is 100%, and the particles can be filtered out. Therefore, the prepared film is very dense and smooth, has good corrosion resistance, and has very strong adhesion to the body.
1. PVD Coating Machine Cathode Arc Filtration: The electromagnetic filtration system is equipped with an ion source that can filter out macroscopic particles and ions generated in the plasma. The ionization rate of deposited particles after magnetic filtration is 100%, and the particles can be filtered out. Therefore, the prepared film is very dense and smooth, has good corrosion resistance, and has very strong adhesion to the body.
2. PVD Coating Machine Enhanced Magnetron Cathode Arc: Cathode arc technology ionizes the target material into an ionic state under vacuum conditions through low voltage and high current, thereby completing the deposition of thin film materials. The enhanced magnetron cathode arc can effectively control the arc on the surface of the target material through the interaction of electromagnetic fields, resulting in higher ionization rates and better film properties.
3. PVD Coating Machine Ion Beam: Hydrocarbon gas is ionized into plasma in the ion source, and under the combined action of the electromagnetic field, carbon ions are released from the ion source. The energy of the ion beam is controlled by adjusting the voltage applied to the plasma. When the hydrocarbon ion beam is introduced into the substrate, the deposition rate is proportional to the ion current density. The ion beam source of the PVD coating machine uses high voltage and high ion energy, so that the film and the substrate are well bonded. The larger the ion current, the faster the deposition speed of the diamond-like film. The main advantages of ion beam technology lie in the deposition of ultra-thin multilayer structures, the process control accuracy can reach several angstroms, and the defects caused by particle contamination in the process can be reduced.
4. PVD Coating Machine Magnetron Sputtering: In a vacuum environment, under the combined action of voltage and magnetic field, ionized inert gas ions bombard the target material, causing the target material to be ejected and deposited on the substrate in the form of ions, atoms or molecules, forming a thin film. Conductive and non-conductive materials can both be sputtered as targets, depending on the ionization power supply used.
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